Update README.md

README.md

@@ -1,3 +1,76 @@
----
-license: mit
----
+---
+language:
+  - en
+license: mit
+pretty_name: EUV Stochastic Source–Resist Coherence Baseline Mapping v0.1
+dataset_name: euv-stochastic-source-resist-coherence-baseline-mapping-v0.1
+tags:
+  - clarusc64
+  - euv
+  - lithography
+  - stochastic
+  - resist
+  - photon-noise
+  - yield
+task_categories:
+  - tabular-to-text
+size_categories:
+  - 1K<n<10K
+configs:
+  - config_name: default
+    data_files:
+      - split: train
+        path: data/train.csv
+      - split: test
+        path: data/test.csv
+---
+
+## What this dataset tests
+
+Stochastic defect emergence is not random.
+
+It rises when coherence decays between:
+
+photon noise  
+pulse stability  
+resist chemistry response  
+line edge roughness  
+defect rate  
+
+This dataset maps the healthy coupling first.
+
+## Task
+
+Predict:
+
+coherence_score 0..1  
+risk_band low or medium or high  
+
+Return JSON
+
+{"coherence_score":0.74,"risk_band":"medium"}
+
+## Inputs
+
+photon_flux_mean_w  
+photon_flux_cv  
+source_pulse_energy_cv  
+
+resist_sensitivity_mj_cm2  
+acid_diffusion_length_nm  
+blur_length_nm  
+
+ler_sigma_nm  
+stochastic_defect_rate_ppm  
+
+## Why it matters
+
+Stochastic failures kill yield quietly.
+
+They appear as rare bridges and missing contacts.
+
+By the time yield alarms trigger, the window is gone.
+
+## Version
+
+v0.1